HELICON ION-SOURCE FOR PLASMA PROCESSING

被引：13
|
作者：
KATYUKHA, VP
KIRICHENKO, GS
RUSAVSKII, AV
TARANOV, VB
SHAMRAI, KP
机构：
[1] Institute for Nuclear Research, Academy of Sciences of Ukraine, Kiev 252028, Prospekt Nauki
来源：
REVIEW OF SCIENTIFIC INSTRUMENTS | 1994年 / 65卷 / 04期
关键词：
D O I：
10.1063/1.1144963
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
The results of theoretical and experimental investigations of dense plasma source resonantly excited by helicon wave are presented. Driven by a single-loop low-voltage (congruent-to 300 V) antenna, a source generates a plasma of density up to 5 X 10(11) cm-3 at gas pressures 0.5-20 mTorr, operates at magnetic, fields < 100 Gs, and produces low-energy ion fluxes (< 60 eV) with current densities up to 7 mA/cm2 and 3.5% nonuniformity within a diameter 10 cm. A high-efficiency helicon source originates in a special kind of ''resonance'' wave discharge, where a sharp increase of plasma resistance occurs near the helicon wave dispersion branches.
引用
收藏
页码：1368 / 1370
页数：3
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