ROOM-TEMPERATURE CVD PROCESS FOR PREPARING BORON-DIFFUSION SOURCES

被引：0
|
作者：
DOBOS, K
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 11期
关键词：
D O I：
10.1149/1.2129509
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：2523 / 2526
页数：4
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