LASER ANNEALING OF NB FILMS PREPARED BY ION-BEAM SPUTTERING

被引：1
|
作者：
TAKEI, K
NAGAI, K
INAMURA, T
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷 / 07期
关键词：
D O I：
10.1143/JJAP.19.L392
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：L392 / L394
页数：3
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