SUPERCONDUCTING PROPERTIES OF REACTIVELY SPUTTERED NIOBIUM NITRIDE THIN FILMS

被引：0
|
作者：
TOTH, LE
机构：
来源：
AMERICAN CERAMIC SOCIETY BULLETIN | 1968年 / 47卷 / 08期
关键词：
D O I：
暂无
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：759 / &
相关论文
共 50 条
  • [21] Growth mechanism of reactively sputtered aluminum nitride thin films
    Hwang, BH
    Chen, CS
    Lu, HY
    Hsu, TC
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2002, 325 (1-2): : 380 - 388
  • [22] Elemental composition of reactively sputtered indium nitride thin films
    Kumar, S
    Motlan, LM
    Tansley, TL
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1996, 35 (4A): : 2261 - 2265
  • [23] SUPERCONDUCTING TRANSITION-TEMPERATURES OF REACTIVELY SPUTTERED FILMS OF TANTALUM NITRIDE AND TUNGSTEN NITRIDE
    KILBANE, FM
    HABIG, PS
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 107 - 109
  • [24] OPTICAL-PROPERTIES AND MICROSTRUCTURE OF REACTIVELY SPUTTERED INDIUM NITRIDE THIN-FILMS
    SULLIVAN, BT
    PARSONS, RR
    WESTRA, KL
    BRETT, MJ
    JOURNAL OF APPLIED PHYSICS, 1988, 64 (08) : 4144 - 4149
  • [25] Stoichiometry and thickness dependence of superconducting properties of niobium nitride thin films
    Beebe, Melissa R.
    Beringer, Douglas B.
    Burton, Matthew C.
    Yang, Kaida
    Lukaszew, R. Alejandra
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2016, 34 (02):
  • [26] DIELECTRIC-PROPERTIES OF REACTIVELY SPUTTERED GALLIUM NITRIDE FILMS
    LAKSHMI, E
    THIN SOLID FILMS, 1981, 83 (01) : L137 - L139
  • [27] Growth, stress and hardness of reactively sputtered tungsten nitride thin films
    Wen, M.
    Meng, Q. N.
    Yu, W. X.
    Zheng, W. T.
    Mao, S. X.
    Hua, M. J.
    SURFACE & COATINGS TECHNOLOGY, 2010, 205 (07): : 1953 - 1961
  • [28] Elemental composition and microstructure of reactively sputtered carbon nitride thin films
    Kumar, Sunil
    Tansley, T.L.
    Journal of Applied Physics, 1994, 76 (07):
  • [29] STRUCTURAL STUDIES OF REACTIVELY SPUTTERED CARBON NITRIDE THIN-FILMS
    KUMAR, S
    TANSLEY, TL
    THIN SOLID FILMS, 1995, 256 (1-2) : 44 - 47
  • [30] Xenon implantation effects on the structural and optical properties of reactively sputtered titanium nitride thin films
    Popovic, M.
    Novakovic, M.
    Mitric, M.
    Zhang, K.
    Rakocevic, Z.
    Bibic, N.
    MATERIALS RESEARCH BULLETIN, 2017, 91 : 36 - 41
12345