OPTICAL PROPERTIES OF TANTALUM OXIDE THIN FILMS OBTAINED BY LASER DEPOSITION TEHNIQUES

被引：0

作者：

Stanciu, George ^{[1
]}

Filipescu, Mihaela ^{[2
]}

Ion, Valentin ^{[3
]}

Andronescu, Ecaterina ^{[1
]}

Dinescu, Maria ^{[2
]}

机构：

[1] Univ Politehn Bucuresti, Fac Appl Chem & Mat Sci, Bucharest, Romania

[2] Natl Inst Laser Plasma & Radiat Phys, Bucharest, Romania

[3] Univ Bucharest, Fac Phys, Natl Inst Laser Plasma & Radiat Phys, Bucharest, Romania

来源：

UNIVERSITY POLITEHNICA OF BUCHAREST SCIENTIFIC BULLETIN SERIES B-CHEMISTRY AND MATERIALS SCIENCE | 2013年 / 75卷 / 02期

关键词：

Tantalum oxide thin films; pulsed laser deposition; radiofrequency oxygen plasma; spectroscopic ellipsometry;

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Tantalum oxide is a compound with attractive properties and important applications in optoelectronis. It has a high refractive index and a good thermal and chemical stability. Tantalum oxide thin layers have been deposited by laser ablation-pulsed laser deposition (PLD) and radiofrequency assisted pulsed laser ablation (RF-PLD) starting from a Tantalum metallic target in oxygen atmosphere. In the present paper the influence of deposition parameters (laser wavelength, substrate temperature and r(6)adiofrequency power) on the morphology and the optical propert(7)ies was studied. The investigation techniques used for the characterization of the deposited layers were atomic force microscopy and spectroellipsometry.

引用

页码：15 / 22

页数：8

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