MICROSTRUCTURAL ANALYSIS OF CAPD TI(C,N) HARD COATINGS

被引：1
|
作者：
ARRANDO, F [1 ]
RODRIGUEZ, RM [1 ]
POLO, MC [1 ]
ESTEVE, J [1 ]
机构：
[1] UNIV BARCELONA,DEPT FIS APLICADA & ELECTR,E-08028 BARCELONA,SPAIN
来源：
VACUUM | 1994年 / 45卷 / 10-11期
关键词：
D O I：
10.1016/0042-207X(94)90004-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We present the results on structure and chemical composition of hard Ti(C,N) films grown on HSS substrates by means of the Cathodic Are Plasma Deposition (CAPD) technique. The different preferential crystallographic orientations of the fee Ti(C,N) phase and different compositions of the films are discussed and correlated with the process parameters. Under extreme process conditions, tetragonal and hexagonal phases are obtained in conjunction with the fee one, revealing the Ti superstoichiometry of these TixCyNz films. A short discussion on the quantitative analysis of the atomic composition of the films is also presented showing the difficulties found in the measurement of the TixCyNz composition when the EDS technique is used, and the improvements obtained with the WDS technique.
引用
收藏
页码：1001 / 1002
页数：2
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