STRUCTURAL AND MORPHOLOGICAL-STUDIES OF ELECTRODEPOSITED AMORPHOUS-SILICON THIN-FILMS

Amorphous silicon thin films obtained from hydrofluosilicic acid using the electrodeposition method are analysed for structure and morphology. The chemical nature of the films is discussed using the data from IR spectroscopy. The electrical resistivity of these films is very high, of the order of 10(12)-10(13) OMEGA cm, under the present experimental conditions. X-ray diffraction spectra revealed that the films are not crystalline in nature. At low concentrations of the electrolyte, scanning electron microscopy photographs exhibited some microstructure with crystalline order of about 100 angstrom, At high concentrations, the structure of the films changed widely to be homogeneous.