THE SYNTHESIS OF SICX FILMS BY DUAL-SOURCE SPUTTER DEPOSITION

被引：12
|
作者：
SEAWARD, KL [1 ]
BARBEE, TW [1 ]
TILLER, WA [1 ]
机构：
[1] STANFORD UNIV,DEPT MAT SCI & ENGN,STANFORD,CA 94305
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 01期
关键词：
D O I：
10.1116/1.573494
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
27
引用
收藏
页码：31 / 37
页数：7
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