DEPOSITION OF HIGH-PURITY NB FILMS BY TETRODE SPUTTERING

被引：2

|

作者：

OGAWA, S

TAKIGUCHI, K

HASEGAWA, T

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1971年 / 8卷 / 01期

关键词：

D O I：

10.1116/1.1316284

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：192 / +

页数：1

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