DEPOSITION OF HIGH-PURITY NB FILMS BY TETRODE SPUTTERING

被引：2
|
作者：
OGAWA, S
TAKIGUCHI, K
HASEGAWA, T
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1971年 / 8卷 / 01期
关键词：
D O I：
10.1116/1.1316284
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：192 / +
页数：1
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