INSITU ELLIPSOMETRY AS A DIAGNOSTIC OF THIN-FILM GROWTH - STUDIES OF AMORPHOUS-CARBON

被引:26
|
作者
COLLINS, RW [1 ]
机构
[1] PENN STATE UNIV,DEPT PHYS,UNIVERSITY PK,PA 16802
关键词
D O I
10.1116/1.576289
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:1378 / 1385
页数:8
相关论文
共 50 条
  • [1] INSITU ELLIPSOMETRY OF THIN-FILM DEPOSITION - IMPLICATIONS FOR AMORPHOUS AND MICROCRYSTALLINE SI GROWTH
    COLLINS, RW
    YANG, BY
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (05): : 1155 - 1164
  • [2] MOLECULAR-DYNAMICS SIMULATION OF THIN-FILM AMORPHOUS-CARBON GROWTH
    GERSTNER, EG
    PAILTHORPE, BA
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1995, 189 (03) : 258 - 264
  • [3] FORMATION OF ORDERED STRUCTURES IN THE THIN-FILM AMORPHOUS-CARBON SILICATE GLASS SYSTEM
    STARBOVA, K
    KOZHUHAROVA, D
    STARBOV, N
    TONCHEV, V
    JOURNAL OF PHYSICAL CHEMISTRY, 1992, 96 (24): : 9964 - 9967
  • [5] OPTICAL CHARACTERIZATION OF A 4-MEDIUM THIN-FILM STRUCTURE BY REAL-TIME SPECTROSCOPIC ELLIPSOMETRY - AMORPHOUS-CARBON ON TANTALUM
    CONG, Y
    AN, I
    VEDAM, K
    COLLINS, RW
    APPLIED OPTICS, 1991, 30 (19) : 2692 - 2703
  • [6] COMPRESSIVE-STRESS-INDUCED FORMATION OF THIN-FILM TETRAHEDRAL AMORPHOUS-CARBON
    MCKENZIE, DR
    MULLER, D
    PAILTHORPE, BA
    PHYSICAL REVIEW LETTERS, 1991, 67 (06) : 773 - 776
  • [7] sp3/sp2 ratio in amorphous-carbon thin film by spectroscopic ellipsometry
    Li, W.J. (lwjmln@mail.yahoo.com), 1600, American Institute of Physics Inc. (94):
  • [8] sp3/sp2 ratio in amorphous-carbon thin film by spectroscopic ellipsometry
    Li, WJ
    Song, ZR
    Yu, YH
    Wang, X
    Zou, SC
    Shen, DS
    JOURNAL OF APPLIED PHYSICS, 2003, 94 (01) : 284 - 287
  • [9] Real-time ellipsometry studies of gold thin-film growth
    Lee, SN
    Hong, JG
    Oh, SG
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1997, 36 (6A): : 3662 - 3668
  • [10] HARD AMORPHOUS-CARBON STUDIED BY ELLIPSOMETRY AND PHOTOLUMINESCENCE
    WAGNER, J
    LAUTENSCHLAGER, P
    JOURNAL OF APPLIED PHYSICS, 1986, 59 (06) : 2044 - 2047