AN EXPERIMENTAL-STUDY ON LASER ANNEALING OF THIN SILICON LAYERS

被引：3
|
作者：
GRIGOROPOULOS, CP [1 ]
BUCKHOLZ, RH [1 ]
DOMOTO, GA [1 ]
机构：
[1] XEROX,WEBSTER RES CTR,MECH ENGN SCI LAB,N TARRYTOWN,NY 10591
来源：
JOURNAL OF HEAT TRANSFER-TRANSACTIONS OF THE ASME | 1988年 / 110卷 / 02期
关键词：
D O I：
10.1115/1.3250501
中图分类号：
O414.1 [热力学];
学科分类号：
摘要：
引用
收藏
页码：416 / 423
页数：8
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