A GENERALIZED PLASMA-ETCHING MODEL WITH AN OBLIQUE MAGNETIC-FIELD

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作者：

ZAWAIDEH, E

KIM, NS

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JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 03期

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D O I：

10.1063/1.343450

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O59 [应用物理学];

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页码：1113 / 1121

页数：9

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