A GENERALIZED PLASMA-ETCHING MODEL WITH AN OBLIQUE MAGNETIC-FIELD

被引：0
|
作者：
ZAWAIDEH, E
KIM, NS
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 03期
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D O I：
10.1063/1.343450
中图分类号：
O59 [应用物理学];
学科分类号：
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页码：1113 / 1121
页数：9
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