PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF THIN-FILMS AND SOME OF THEIR ETCHING CHARACTERISTICS

被引：0
|
作者：
HOLLAHAN, JR [1 ]
WAUK, MT [1 ]
ROSLER, RS [1 ]
机构：
[1] APPL MAT INC,SANTA CLARA,CA 95051
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1977年 / 124卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C297 / C297
页数：1
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