POLYMERIC CYANOBORANE, (CNBH2)N - SINGLE SOURCE FOR CHEMICAL VAPOR-DEPOSITION OF BORON-NITRIDE FILMS

被引：23

作者：

MAYA, L ^{[1
]}

RICHARDS, HL ^{[1
]}

机构：

[1] OAK RIDGE NATL LAB,DEV SECT,Y-12 PLANT,OAK RIDGE,TN 37831

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1991年 / 74卷 / 02期

关键词：

CHEMICAL VAPOR DEPOSITION; FILMS; BORANES; POLYMERS; AMMONIA;

D O I：

10.1111/j.1151-2916.1991.tb06895.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Polymeric cyanoborane, (CNBH2)n, is a material readily prepared by passing hydrogen chloride through an ether suspension of sodium cyanotrihydroborate. This polymeric material was volatilized in a CVD reactor to produce, at 600-degrees-C, amorphous films containing boron, nitrogen, and carbon. Residual carbon present in the films was removed by ammonia treatment at 800-degrees-C, producing nearly stoichiometric boron nitride films that were adherent to a variety of substrates including silicon.

引用

页码：406 / 409

页数：4

共 50 条

[31] CUBIC BORON-NITRIDE FILMS SYNTHESIZED BY LOW-ENERGY ION-BEAM-ENHANCED VAPOR-DEPOSITION
IKEDA, T
APPLIED PHYSICS LETTERS, 1992, 61 (07) : 786 - 788
[32] PREPARATION OF CUBIC BORON-NITRIDE FILMS BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF BF3, N2 AND H2 GAS-MIXTURES
MENDEZ, JM
MUHL, S
FARIAS, M
SOTO, G
COTAARAIZA, L
SURFACE & COATINGS TECHNOLOGY, 1991, 49 (1-3): : 422 - 426
[33] EFFECTS OF A NEGATIVE SELF-BIAS ON THE GROWTH OF CUBIC BORON-NITRIDE PREPARED BY PLASMA CHEMICAL VAPOR-DEPOSITION
YOKOYAMA, H
OKAMOTO, M
OSAKA, Y
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (02): : 344 - 348
[34] CHEMICAL VAPOR-DEPOSITION OF ALUMINUM NITRIDE THIN-FILMS
GORDON, RG
RIAZ, U
HOFFMAN, DM
JOURNAL OF MATERIALS RESEARCH, 1992, 7 (07) : 1679 - 1684
[35] THERMODYNAMICS AND KINETICS OF CHEMICAL VAPOR-DEPOSITION OF ALUMINUM NITRIDE FILMS
PAULEAU, Y
BOUTEVILLE, A
HANTZPERGUE, JJ
REMY, JC
CACHARD, A
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (07) : 1532 - 1537
[36] GROWTH OF BORON-NITRIDE THIN-FILMS BY METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION
PHANI, AR
ROY, S
RAO, VJ
THIN SOLID FILMS, 1995, 258 (1-2) : 21 - 25
[37] STUDY OF BORON-NITRIDE GATE INSULATORS GROWN BY LOW-TEMPERATURE PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION ON INP
BATH, A
VANDERPUT, PJ
SCHOONMAN, J
LEPLEY, B
APPLIED SURFACE SCIENCE, 1989, 39 (1-4) : 135 - 140
[38] Chemical vapor deposition of pyrolytic boron nitride ceramics from single source precursor
Gao, Shitao
Li, Bin
Zhang, Changrui
Li, Duan
Liu, Rongjun
Wang, Siqing
CERAMICS INTERNATIONAL, 2017, 43 (13) : 10020 - 10025
[39] EVIDENCE OF A SHALLOW JUNCTION FORMATION FROM PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF BORON-NITRIDE AND SILICON BORON-NITRIDE
NGUYEN, T
VANNGUYEN, S
DOBUZINSKY, DM
APPLIED PHYSICS LETTERS, 1993, 63 (15) : 2103 - 2105
[40] BORON-NITRIDE THIN-FILMS ON SI(100) BY METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION
DEVI, GS
ROY, S
RAO, VJ
SOLID STATE COMMUNICATIONS, 1993, 87 (01) : 67 - 70

← 1 2 3 4 5 →