AES INVESTIGATIONS OF AR+ ION RETENTION IN SI DURING AR SPUTTERING

被引：11
|
作者：
KEMPF, J
机构：
来源：
APPLIED PHYSICS | 1978年 / 16卷 / 01期
关键词：
D O I：
10.1007/BF00931420
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：43 / 46
页数：4
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