SURFACE STRESS EFFECTS ON THE THERMODYNAMICS OF EPITAXY

被引：2
|
作者：
CAMMARATA, RC
SIERADZKI, K
机构：
[1] Dept. of Mater. Sci. and Eng., The Johns Hopkins University, Baltimore, 21218, MD
来源：
JOURNAL OF ELECTRONIC MATERIALS | 1991年 / 20卷 / 10期
关键词：
SURFACE STRESS; THERMODYNAMICS;
D O I：
10.1007/BF02665969
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
An analysis of the thermodynamics of epitaxy in thin films is presented which includes the effects of the surface stresses of the free surface and the film-substrate interface. It is shown that these effects, which are usually ignored in the theory of epitaxy, can have a major influence on both the critical thickness for epitaxy and on the partitioning of the misfit strain between the volume elastic strain and interface dislocations.
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页码：815 / 817
页数：3
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