共 50 条
- [22] Assessed total and partial ionization cross sections for CF4, C2F6, C3F8, CHF3, CF3I, c-C4F8, Cl2, CCl2F2, BCl3, SF6, and fragments of CF4 and SF6 GASEOUS DIELECTRICS X, 2004, : 173 - 180
- [23] ANALYSIS OF F2 HF NF3 T-N2F2 AND N2F4 MIXTURES BY GAS CHROMATOGRAPHY JOURNAL OF GAS CHROMATOGRAPHY, 1968, 6 (07): : 392 - &
- [24] Multiscale approach for simulation of silicon etching using SF6/C4F8 Bosch process JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2017, 35 (03):
- [28] Study of CF4, C2F6, SF6 and NF3 decomposition characteristics and etching performance in plasma state JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (9A): : 5724 - 5728
- [29] Study of CF4, C2F6, SF6 and NF3 decomposition characteristics and etching performance in plasma state Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, 9 A (5724-5728):
- [30] Study of C4F8/N2 and C4F8/Ar/N2 plasmas for highly selective organosilicate glass etching over Si3N4 and SiC JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2003, 21 (05): : 1708 - 1716