THE STATE OF CS ON NEGATIVE ELECTRON-AFFINITY SURFACES

被引：9

|

作者：

MIYAO, M

WADA, T

NITTA, T

HAGINO, M

机构：

来源：

APPLIED SURFACE SCIENCE | 1988年 / 33-4卷

关键词：

D O I：

10.1016/0169-4332(88)90328-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

收藏

页码：364 / 369

页数：6

相关论文

共 50 条

[1] CS-O NEGATIVE ELECTRON-AFFINITY SURFACES ON SILICON
HOWORTH, JR
HOLTOM, R
TRAWNY, EW
HARMER, AL
APPLIED PHYSICS LETTERS, 1972, 21 (07) : 316 - &
[2] ELECTRON-EMISSION FROM SI(100) NEGATIVE ELECTRON-AFFINITY SURFACES
BURT, MG
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1977, 10 (08) : 1161 - 1166
[3] NEGATIVE ELECTRON-AFFINITY MULTIALKALI PHOTOCATHODES
GUO, TL
GAO, HR
APPLIED SURFACE SCIENCE, 1993, 70-1 : 355 - 358
[4] INTEGRATION OF MICROSTRUCTURES ONTO NEGATIVE ELECTRON-AFFINITY CATHODES - FABRICATION AND OPERATION OF AN ADDRESSABLE NEGATIVE ELECTRON-AFFINITY CATHODE
SANTOS, EJP
MACDONALD, NC
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2362 - 2366
[5] OBTAINING NEGATIVE ELECTRON-AFFINITY ON SILICON
KAPITSA, ML
TELYATNIKOVA, TA
PUSTYLNIK, IA
SHEMELEV, VI
KRUGLOV, MV
IZVESTIYA AKADEMII NAUK SSSR SERIYA FIZICHESKAYA, 1976, 40 (08): : 1638 - 1641
[6] NEGATIVE ELECTRON-AFFINITY (SI-NA2KSB-CS)-O-CS PHOTOCATHODE
GUO, TL
GAO, HR
APPLIED PHYSICS LETTERS, 1991, 58 (16) : 1757 - 1758
[7] ELECTRIC-FIELD ENHANCEMENT OF ESCAPE PROBABILITY ON NEGATIVE ELECTRON-AFFINITY SURFACES
HOWORTH, JR
HARMER, AL
TRAWNY, EWL
HOLTOM, R
SHEPPARD, CJ
APPLIED PHYSICS LETTERS, 1973, 23 (03) : 123 - 124
[8] METASTABILITY OF PHOTOEMISSION FROM WITH NEGATIVE ELECTRON-AFFINITY
BAGRAEV, NT
PISMA V ZHURNAL TEKHNICHESKOI FIZIKI, 1988, 14 (04): : 329 - 334
[9] EVIDENCE FOR ELECTRON-EMISSION STIMULATED DESORPTION FROM NEGATIVE ELECTRON-AFFINITY GAAS SURFACES
SCHADE, H
SURFACE SCIENCE, 1976, 55 (01) : 20 - 28
[10] THERMODYNAMIC STABILITY OF PHOTOCATHODES WITH NEGATIVE ELECTRON-AFFINITY
VORONIN, GF
GORSHKOVA, TI
RADIOTEKHNIKA I ELEKTRONIKA, 1977, 22 (05): : 1043 - 1046

← 1 2 3 4 5 →