RING FORMATION OF KIRKENDALL VOIDS IN PB-ALLOY THIN-FILM DIFFUSION COUPLES

被引：4

|

作者：

HUANG, HCW ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

APPLIED PHYSICS LETTERS | 1982年 / 41卷 / 08期

关键词：

D O I：

10.1063/1.93674

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：724 / 726

页数：3

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