COMPETITIVE MECHANISMS IN REACTIVE ION ETCHING IN A CF4 PLASMA

被引：50
|
作者：
SCHWARTZ, GC
ROTHMAN, LB
SCHOPEN, TJ
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1979年 / 126卷 / 03期
关键词：
D O I：
10.1149/1.2129063
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：464 / 469
页数：6
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