THE EFFECT OF OXYGEN ON THE ETCH RATE OF NF3 DISCHARGES

被引：19
|
作者：
NORDHEDEN, KJ
VERDEYEN, JT
机构：
[1] Univ of Illinois at, Urbana-Champaign, Urbana, IL, USA, Univ of Illinois at Urbana-Champaign, Urbana, IL, USA
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 10期
关键词：
D O I：
10.1149/1.2108363
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
13
引用
收藏
页码：2168 / 2171
页数：4
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