GENERAL PLASMA CHARACTERISTICS OF A BERKELEY MULTIFILAMENT ION-SOURCE

被引：16
|
作者：
SCHOENBERG, KF
KUNKEL, WB
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1979年 / 50卷 / 07期
关键词：
D O I：
10.1063/1.326578
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：4685 / 4691
页数：7
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