PULSED EXCIMER-LASER DEPOSITION OF POTASSIUM TITANYL PHOSPHATE FILMS

被引：12

作者：

XIONG, FL

CHANG, RPH

HAGERMAN, ME

KOZHEVNIKOV, VL

POEPPELMEIER, KR

ZHOU, HT

WONG, GK

KETTERSON, JB

WHITE, CW

机构：

[1] NORTHWESTERN UNIV, DEPT CHEM, EVANSTON, IL 60208 USA

[2] NORTHWESTERN UNIV, DEPT PHYS & ASTRON, EVANSTON, IL 60208 USA

[3] OAK RIDGE NATL LAB, DIV SOLID STATE, OAK RIDGE, TN 37830 USA

来源：

APPLIED PHYSICS LETTERS | 1994年 / 64卷 / 02期

关键词：

D O I：

10.1063/1.111551

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Nonlinear optical thin films of potassium titanyl phosphate (KTP) have been successfully fabricated by pulsed excimer laser deposition on substrates of sapphire and Si. The films deposited on sapphire substrates in the temperature ranges of 450-550 degrees C show good crystallinity with preferential (100) and (011) orientations; on silicon, the films are polycrystalline. The stoichiometry of the films has been found to be Ti rich (about 20% higher). The effective refractive index of the films has been evaluated by spectroscopic ellipsometry with values between 1.75 and 2.0 in the spectral region 0.3-0.9 mu m, consistent with the bulk value. The deposited films show a promising nonlinear optical response with high second-harmonic generation efficiency, comparable to that of single-crystal KTP

引用

页码：161 / 163

页数：3

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