Influence of titanium on the structural stability of sputter-deposited W-Co-C films

被引：6
|
作者：
Trindade, B. [1 ]
Vieira, M. T.
Bauer-Grosse, E.
机构：
[1] Univ Coimbra, Fac Ciencias & Tecnol, Dept Engn Mecan, P-3000 Coimbra, Portugal
[2] Ecole Natl Super Mines, Lab Sci & Genie Surfaces, F-54042 Nancy, France
来源：
SURFACE & COATINGS TECHNOLOGY | 1995年 / 74-75卷 / 1-3期
关键词：
carbides; coatings; sputtering; structural stability;
D O I：
10.1016/0257-8972(95)08278-6
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
A film of W45Ti9Co12C34 has been synthesized by non-reactive r.f. sputtering onto a steel substrate and heat treated in a high vacuum furnace at increasing temperatures up to 800 degrees C. Investigation of its structure, hardness and adhesion is performed before and after each heat treatment. The results show that the presence of titanium in W-Co-C films promotes spontaneous crystallization and improves their thermal stability during annealing at increasing temperatures.
引用
收藏
页码：802 / 805
页数：4
相关论文
共 50 条
  • [31] Influence of nitrogen doping on the sputter-deposited WO3 films
    Chawla, Amit Kumar
    Singhal, Sonal
    Gupta, Hari Om
    Chandra, Ramesh
    THIN SOLID FILMS, 2009, 518 (05) : 1430 - 1433
  • [32] W-B-N sputter-deposited thin films for mechanical application
    Louro, C
    Lamni, R
    Lévy, F
    SURFACE & COATINGS TECHNOLOGY, 2005, 200 (1-4): : 753 - 759
  • [33] Magnetic and structural properties of sputter-deposited Co-Sm bilayers
    Tanahashi, K
    Doi, M
    Takano, M
    Kumagai, N
    Motoi, K
    PROCEEDINGS OF THE FIFTH INTERNATIONAL SYMPOSIUM ON MAGNETIC MATERIALS, PROCESSES, AND DEVICES: APPLICATIONS TO STORAGE AND MICROELECTROMECHANICAL SYSTEMS (MEMS), 1999, 98 (20): : 188 - 193
  • [34] FRACTAL AGGREGATES IN SPUTTER-DEPOSITED FILMS - COMMENT
    SMITH, DT
    VALLES, JM
    HALLOCK, RB
    PHYSICAL REVIEW LETTERS, 1985, 54 (24) : 2646 - 2646
  • [35] Magnetostriction in polycrystalline sputter-deposited TbDyFe films
    Williams, P.I.
    Lord, D.G.
    Grundy, P.J.
    Journal of Applied Physics, 1994, 75 (10 pt 1):
  • [36] In situ stress measurements of sputter-deposited films
    Honda, N
    Shoji, F
    Kidoguchi, S
    Hamada, Y
    Nagata, M
    Oura, K
    SENSORS AND ACTUATORS A-PHYSICAL, 1997, 62 (1-3) : 663 - 667
  • [37] BACKSCATTERING SPECTROMETRY ON AR SPUTTER-DEPOSITED FILMS
    KAZAMA, NS
    FUJIMORI, H
    SCIENCE REPORTS OF THE RESEARCH INSTITUTES TOHOKU UNIVERSITY SERIES A-PHYSICS CHEMISTRY AND METALLURGY, 1983, 31 (01): : 16 - 27
  • [38] FRICTIONAL DURABILITY OF SPUTTER-DEPOSITED FLUOROCARBON FILMS
    YAMADA, Y
    NAGAYAMA, Y
    TANAKA, K
    JOURNAL OF JAPANESE SOCIETY OF TRIBOLOGISTS, 1993, 38 (09) : 817 - 824
  • [39] FECR SPUTTER-DEPOSITED FILMS WITH PERPENDICULAR ANISOTROPY
    SAIKI, K
    SAITO, K
    ONISHI, K
    NUMATA, T
    INOKUCHI, S
    SAKURAI, Y
    IEEE TRANSACTIONS ON MAGNETICS, 1985, 21 (05) : 1471 - 1473
  • [40] Oxygen in sputter-deposited ZnTe thin films
    Merita, S
    Krämer, T
    Mogwitz, B
    Franz, B
    Polity, A
    Meyer, BK
    PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 3, NO 4, 2006, 3 (04): : 960 - +
12345