PHYSICAL MODELING OF PYROMETRIC INTERFEROMETRY DURING MOLECULAR-BEAM EPITAXIAL-GROWTH OF III-V LAYERED STRUCTURES

被引：11
|
作者：
LEE, HP
RANALLI, E
LIU, X
机构：
[1] Department of Electrical and Computer Engineering, University of California, Irvine, Irvine
来源：
APPLIED PHYSICS LETTERS | 1995年 / 67卷 / 13期
关键词：
D O I：
10.1063/1.115415
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A detailed physical model of pyrometric interferometry during molecular beam epitaxy growth of III-V layers is presented. The pyrometric radiation intensity is expressed as spatial convolution of the spontaneous emission rates and the propagation response of the sample. The new formalism, together with empirical modeling of background signal provide a generic framework for implementing a model-reference closed-loop control system for epitaxial growth of multilayer structures. (C) 1995 American Institute of Physics.
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页码：1824 / 1826
页数：3
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