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- [9] REACTIVE ION ETCHING OF SILICON USING BROMINE CONTAINING PLASMAS JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03): : 1696 - 1701
- [10] A MODEL OF STEADY-STATE DISTRIBUTION OF REACTIVE DRUG FOR INTRAMUSCULAR INJECTION CHINESE SCIENCE BULLETIN, 1990, 35 (13): : 1142 - 1144