RHEED STUDY ON THE GE/SI(111) AND SI/GE(111) SYSTEMS - REACTION OF GE WITH THE SI(111)(7X7) SURFACE

被引：77
|
作者：
ICHIKAWA, T [1 ]
INO, S [1 ]
机构：
[1] UNIV TOKYO,FAC SCI,DEPT PHYS,TOKYO 113,JAPAN
来源：
SURFACE SCIENCE | 1984年 / 136卷 / 2-3期
关键词：
D O I：
10.1016/0039-6028(84)90611-3
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：267 / 284
页数：18
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