PURITY CONSIDERATIONS FOR AMORPHOUS-SILICON THIN-FILMS

被引：0
|
作者：
DICKSON, CR
FIESELMANN, BF
OSWALD, RS
机构：
来源：
JOURNAL OF CRYSTAL GROWTH | 1988年 / 89卷 / 01期
关键词：
D O I：
10.1016/0022-0248(88)90071-1
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
引用
收藏
页码：49 / 61
页数：13
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