WEAK-LOCALIZATION, SPIN-ORBIT, AND ELECTRON-ELECTRON INTERACTION EFFECTS IN TWO-DIMENSIONAL AND 3-DIMENSIONAL BISMUTH-FILMS

被引：29
|
作者：
MCLACHLAN, DS [1 ]
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源：
PHYSICAL REVIEW B | 1983年 / 28卷 / 12期
关键词：
D O I：
10.1103/PhysRevB.28.6821
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：6821 / 6832
页数：12
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