IMPROVING THE PERFORMANCE OF INAS1-XSBX/INSB INFRARED DETECTORS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION

被引:27
|
作者
BIEFELD, RM
WENDT, JR
KURTZ, SR
机构
[1] Sandia National Laboratories, Albuquerque
关键词
D O I
10.1016/0022-0248(91)90566-N
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Diethylselenium and tetraethyltin were investigated as n-type dopants for InSb. Carrier concentrations between 6X10(15) and 4X10(18)cm-3 with 77 K mobilities ranging from 75,000 to 10,000 cm2/V.s were achieved for Sn doped InSb. Triethylantimony and trimethylindium were used to grow InSb over the temperature range of 410-470-degrees-C with a decrease in the p-type background occurring at 410-degrees-C. Diodes were prepared using tetraethyltin, trimethylindium and trimethylantimony at 470-degrees-C. The resulting current-voltage characteristics are improved over those of diodes grown previously using dimethyltellurium. SIMS measurements indicate a diffusion coefficient for Sn in InSb at 470-degrees-C that is approximately 1X10(-15)cm2/s.
引用
收藏
页码:836 / 839
页数:4
相关论文
共 50 条
  • [41] THE GROWTH-RATE OF CDXHG1-XTE GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
    TAKADA, H
    MURAKAMI, T
    SUITA, M
    YASUMURA, K
    ENDO, Y
    TAKAHASHI, K
    NUNOSHITA, M
    JOURNAL OF CRYSTAL GROWTH, 1992, 117 (1-4) : 44 - 48
  • [42] HEAVILY SI-DOPED GAAS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
    FURUHATA, N
    KAKIMOTO, K
    YOSHIDA, M
    KAMEJIMA, T
    JOURNAL OF APPLIED PHYSICS, 1988, 64 (09) : 4692 - 4695
  • [43] PHOTOLUMINESCENCE OF ALGAAS GAAS QUANTUM WELLS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
    KAWAI, H
    KANEKO, K
    WATANABE, N
    JOURNAL OF APPLIED PHYSICS, 1984, 56 (02) : 463 - 467
  • [44] MAGNETOPHOTOLUMINESCENCE CHARACTERIZATION OF RESIDUAL DONORS IN GAAS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
    WATKINS, SP
    HAACKE, G
    BURKHARD, H
    THEWALT, MLW
    CHARBONNEAU, S
    JOURNAL OF APPLIED PHYSICS, 1988, 64 (06) : 3205 - 3209
  • [45] THE M-CENTER IN ZINC SELENIDE GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
    ZHENG, JZ
    ALLEN, JW
    YATES, HM
    WILLIAMS, JO
    JOURNAL OF CRYSTAL GROWTH, 1992, 117 (1-4) : 358 - 361
  • [46] ANOMALOUS MG INCORPORATION BEHAVIOR IN INGAALP GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
    NISHIKAWA, Y
    SUGAWARA, H
    KOKUBUN, Y
    JOURNAL OF CRYSTAL GROWTH, 1992, 119 (3-4) : 292 - 296
  • [47] INTERFACE CHARACTERIZATION OF (IN,GA)AS/ALGAAS LAYERS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
    KIM, J
    ALWAN, JJ
    COLEMAN, JJ
    WAYMAN, CM
    MATERIALS LETTERS, 1991, 11 (5-7) : 151 - 154
  • [48] ER-DOPED INP AND GAAS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
    UWAI, K
    NAKAGOME, H
    TAKAHEI, K
    APPLIED PHYSICS LETTERS, 1987, 51 (13) : 1010 - 1012
  • [49] HETEROINTERFACE STABILITY IN GAAS-ON-SI GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
    PEARTON, SJ
    MALM, DL
    HEIMBROOK, LA
    KOVALCHICK, J
    ABERNATHY, CR
    CARUSO, R
    VERNON, SM
    HAVEN, VE
    APPLIED PHYSICS LETTERS, 1987, 51 (09) : 682 - 684
  • [50] EFFECTS OF ORDERING ON THE OPERATION OF ALGAINP LASERS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
    NAKANO, K
    TODA, A
    YAMAMOTO, T
    ISHIBASHI, A
    APPLIED PHYSICS LETTERS, 1992, 61 (16) : 1959 - 1961