ELECTRON-ATTACHMENT REACTIONS IN MIXED SF6/N-2 CLUSTERS

被引:11
|
作者
INGOLFSSON, O
ILLENBERGER, E
机构
[1] Institut für Physikalische und Theoretische, Freie Universität Berlin, D-14195 Berlin
关键词
D O I
10.1016/0009-2614(95)00630-M
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Low energy (0-6 eV) electron attachment to clusters composed of SF6 and N-2 yields (SF6)(n)(-) and anionic complexes containing SF6 and N-2. The energy profile for the formation of these anions indicates strong contributions due to inelastic electron scattering via the N-2(-)((2) Pi) resonance followed by intracluster electron transfer. This scattering feature peaks near 2 eV at low stagnation pressure and is shifted to 1.5 eV at 7 bar. The significant shift of the N-2(-) resonance towards lower energy with respect to the gas phase (2.3 eV) is due to the solvation of N-2(-) and the electron transfer behavior between N-2(-) and SF6.
引用
收藏
页码:180 / 184
页数:5
相关论文
共 50 条
  • [41] ELECTRON-ATTACHMENT TO HYDROGEN HALIDE CLUSTERS
    QUITEVIS, EL
    BOWEN, KH
    LIESEGANG, GW
    HERSCHBACH, DR
    JOURNAL OF PHYSICAL CHEMISTRY, 1983, 87 (12): : 2076 - 2079
  • [42] Ionization and attachment coefficients in mixtures of SF6 and N2
    Kim, Sang-Nam
    Transactions of the Korean Institute of Electrical Engineers, 2009, 58 (3 P): : 44 - 47
  • [43] THERMAL ELECTRON-ATTACHMENT TO SF4
    BABCOCK, LM
    STREIT, GE
    JOURNAL OF PHYSICAL CHEMISTRY, 1982, 86 (08): : 1240 - 1242
  • [44] PREDISCHARGE DEVELOPMENT IN N-2 AND SF6 AT HIGH GAS-PRESSURE
    LIEBEROTHLEDEN, B
    PFEIFFER, W
    IEEE TRANSACTIONS ON ELECTRICAL INSULATION, 1989, 24 (02): : 285 - 296
  • [45] STUDIES OF AR AND N-2 USING THRESHOLD PHOTOELECTRON-SPECTROSCOPY BY ELECTRON-ATTACHMENT (TPSA)
    CHUTJIAN, A
    AJELLO, JM
    JOURNAL OF CHEMICAL PHYSICS, 1977, 66 (10): : 4544 - 4550
  • [46] A COMPARATIVE-STUDY OF SF6 AND N-2 ARCS IN ACCELERATING FLOW
    ZHANG, JF
    FANG, MTC
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1988, 21 (05) : 730 - 736
  • [47] TRANSIENT-BEHAVIOR OF GAS BLAST ARCS IN SF6 AND N-2
    TUMA, DT
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1980, 25 (02): : 98 - 98
  • [48] ELECTRON-ATTACHMENT TO SF6 IN GASEOUS AR AND XE - COMPARISON TO RESULTS IN LIQUID AR AND XE AND ENERGY OF EXCESS ELECTRONS
    CHRISTOPHOROU, LG
    HUNTER, SR
    CARTER, JG
    RADIATION PHYSICS AND CHEMISTRY, 1989, 34 (05): : 819 - 827
  • [49] ELECTRON-ATTACHMENT RATE CONSTANTS OF SOCL2 IN AR, N-2, AND CH4
    WANG, WC
    LEE, LC
    JOURNAL OF CHEMICAL PHYSICS, 1986, 85 (11): : 6470 - 6474
  • [50] GASEOUS THERMAL ELECTRON REACTIONS - ATTACHMENT TO SF6 AND C7F14
    MAHAN, BH
    YOUNG, CE
    JOURNAL OF CHEMICAL PHYSICS, 1966, 44 (05): : 2192 - &