DATA-ANALYSIS FOR SPECTROSCOPIC ELLIPSOMETRY

被引:273
|
作者
JELLISON, GE
机构
[1] Solid State Division, Oak Ridge National Laboratory, Oak Ridge
关键词
D O I
10.1016/0040-6090(93)90298-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The modeling of spectroscopic ellipsometry data is reviewed, and is divided into three phases. The first phase involves the calculation of the Fresnel reflection coefficients for a given layer structure; it is shown that the Abeles formalism provides the most flexibility, and can be readily related. to the Berreman formalism for calculations involving anisotropic layers. The second phase is to parameterize the optical functions of each individual layer; several models are reviewed, including effective media, the Lorentz oscillator and a recent parameterization of amorphous semiconductors. The final phase involves the fitting of the spectroscopic ellipsometry data to the model, where different figures of merit of the fitting function are discussed. A proper numerical analysis technique requires that the reduced chi2 be used as the figure of merit, which will result in the proper weighting of data points, and in obtaining meaningful error limits and a measure of the goodness of fit.
引用
收藏
页码:416 / 422
页数:7
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