SELF-DIFFUSION AND IMPURITY DIFFUSION OF FCC METALS USING THE 5-FREQUENCY MODEL AND THE EMBEDDED ATOM METHOD

被引:309
|
作者
ADAMS, JB
FOILES, SM
WOLFER, WG
机构
[1] Sandia Natl Lab, United States
关键词
Metallography--Microstructures;
D O I
10.1557/JMR.1989.0102
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The activation energies for self-diffusion of transition metals (Au, Ag, Cu, Ni, Pd, Pt) have been calculated with the Embedded Atom Method (EAM). The results agree well with experimental data for both mono-vacancy and di-vacancy mechanisms. The EAM was also used to calculate activation energies for vacancy migration near dilute impurities. These energies determine the atomic jump frequencies of the classic five-frequency formula, which yields the diffusion rates of impurites by a mono-vacancy mechanism. These calculations agree fairly well with experiment and with Neumann and Hirschwald's Tm model.
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页码:102 / 112
页数:11
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