ELECTROCHEMICAL STUDIES RELATED TO CU(I) CHEMICAL VAPOR-DEPOSITION PRECURSORS (BETA-DIKETONATE)CULN

被引：0
|
作者：
SHIN, UY
HAMPDENSMITH, MJ
KODAS, TT
机构：
[1] UNIV NEW MEXICO,DEPT CHEM,ALBUQUERQUE,NM 87131
[2] UNIV NEW MEXICO,DEPT CHEM ENGN,ALBUQUERQUE,NM 87131
[3] UNIV NEW MEXICO,CTR MICROENGN CERAM,ALBUQUERQUE,NM 87131
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1992年 / 203卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
引用
收藏
页码：376 / INOR
相关论文
共 50 条
  • [31] DEPOSITION OF PB(ZR,TI)O-3 THIN-FILMS BY METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION USING BETA-DIKETONATE PRECURSORS AT LOW-TEMPERATURES
    HWANG, CS
    KIM, HJ
    JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1995, 78 (02) : 329 - 336
  • [32] Deposition of Cu films from supercritical fluids using Cu(I) β-diketonate precursors
    Cabañas, A
    Blackburn, JM
    Watkins, JJ
    MICROELECTRONIC ENGINEERING, 2002, 64 (1-4) : 53 - 61
  • [33] INVESTIGATIONS OF BARIUM BETA-DIKETONATE COMPLEXES USED IN CHEMICAL-VAPOR-DEPOSITION OF HIGH-T-C OXIDE-FILMS
    WATSON, IM
    ATWOOD, MP
    HAQ, S
    SUPERCONDUCTOR SCIENCE & TECHNOLOGY, 1994, 7 (09): : 672 - 680
  • [34] PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION WITH TITANIUM AMIDES AS PRECURSORS
    STOCK, HR
    BERNDT, H
    MAYR, P
    SURFACE & COATINGS TECHNOLOGY, 1991, 46 (01): : 15 - 23
  • [35] METALORGANIC CHEMICAL VAPOR-DEPOSITION OF INDIUM-PHOSPHIDE BY PULSING PRECURSORS
    CHEN, WK
    CHEN, JC
    ANTHONY, L
    LIU, PL
    APPLIED PHYSICS LETTERS, 1989, 55 (10) : 987 - 989
  • [36] VOLATILITIES OF PRECURSORS FOR CHEMICAL VAPOR-DEPOSITION OF SUPERCONDUCTING THIN-FILMS
    YUHYA, S
    KIKUCHI, K
    YOSHIDA, M
    SUGAWARA, K
    SHIOHARA, Y
    MOLECULAR CRYSTALS AND LIQUID CRYSTALS, 1990, 184 : 231 - 235
  • [37] NEW PRECURSORS FOR CHEMICAL VAPOR-DEPOSITION OF PLATINUM AND THE HYDROGEN EFFECT ON CVD
    KUMAR, R
    ROY, S
    RASHIDI, M
    PUDDEPHATT, RJ
    POLYHEDRON, 1989, 8 (04) : 551 - 553
  • [38] [TI(IV)(BETA-DIKETONATE)X(OR)Y] MOCVD-PRECURSORS FOR THE DEPOSITION OF TIO2 FILMS
    PLAPPERT, EC
    DAHMEN, KH
    HAUERT, R
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1995, 209 : 184 - INOR
  • [39] CHEMICAL VAPOR-DEPOSITION ON SILICON - INSITU SURFACE STUDIES
    FOORD, JS
    JACKMAN, RB
    CHEMICAL PHYSICS LETTERS, 1984, 112 (02) : 190 - 194
  • [40] PROCESSING STUDIES OF CHEMICAL VAPOR-DEPOSITION OF NIOBIUM AND TANTALUM
    FITZER, E
    KEHR, D
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (08) : C245 - C245
12345