STRUCTURE AND PERFECTION OF THERMALLY-GROWN OXIDE FILMS ON SILICON

被引：0
|
作者：
STICKLER, R
KNOPP, AN
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1965年 / 112卷 / 07期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C148 / &
相关论文
共 50 条
  • [1] STRUCTURE AND PERFECTION OF THERMALLY GROWN OXIDE FILMS ON SILICON
    KNOPP, AN
    STICKLER, R
    ELECTROCHEMICAL TECHNOLOGY, 1967, 5 (1-2P): : 37 - +
  • [2] Nanoscale Topography of Thermally-Grown Oxide Films at Right-Angled Convex Corners of Silicon
    Sarioglu, A. Fatih
    Kupnik, Mario
    Vaithilingam, Srikant
    Khuri-Yakub, Butrus T.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2012, 159 (02) : H79 - H84
  • [3] Thermally-grown silicon-dioxide waveguides for use in UV light
    Ura, S
    Nakashiba, T
    Suhara, T
    Nishihara, H
    Lambeck, PV
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (3B): : 1487 - 1489
  • [4] Thermally-grown silicon-dioxide waveguides for use in UV light
    Ura, Shogo, 2000, JJAP, Tokyo, Japan (39):
  • [5] A nanoindentation study of thermally-grown-oxide films on silicon
    Helvaci, F
    Cho, JY
    Fundamentals of Nanoindentation and Nanotribology III, 2005, 841 : 375 - 380
  • [6] BUCKLING OF THERMALLY-GROWN SIO2 THIN-FILMS
    WILMSEN, CW
    THOMPSON, EG
    MEISSNER, GH
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1972, ED19 (01) : 122 - &
  • [7] Natural light-trapping nanostructures on thermally-grown cupric oxide
    Rahman, Faiz
    Hasan, Md Mahmudul
    Kordesch, Martin E.
    MATERIALS RESEARCH BULLETIN, 2023, 159
  • [8] EFFECT OF A SILICON-BORON PHASE ON THERMALLY GROWN SILICON OXIDE FILMS
    FITZGIBBONS, WA
    KLOFFENSTEIN, T
    BUSEN, KM
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (02) : 272 - +
  • [9] EFFECT OF A SILICON-BORON PHASE ON THERMALLY GROWN SILICON OXIDE FILMS
    FITZGIBB.WA
    KLOFFENS.T
    BUSEN, KM
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) : C250 - &
  • [10] Refracted X-ray fluorescence (RXF) applied to the study of thin films and thermally-grown oxide scales
    Koshelev, I
    Paulikas, AP
    Veal, BW
    OXIDATION OF METALS, 1999, 51 (1-2): : 23 - 54
12345