RESIDUAL-STRESS AND THERMAL-EXPANSION OF SPUN-ON POLYIMIDE FILMS

被引:53
|
作者
ELSNER, G
机构
[1] IBM Deutschland GmbH, Sindelfingen, West Ger, IBM Deutschland GmbH, Sindelfingen, West Ger
关键词
MATERIALS TESTING - Residual Stresses - PLASTICS FILMS - Thermal Expansion - STRESSES - Measurements;
D O I
10.1002/app.1987.070340231
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The residual stress in spin coated films and the effect of heat treatments on this stress were determined by the Fizeau interference method. Three types of spin coated polyimide (PI) films have been studied. Two of them were prepared by thermal conversion of their poly(amic acid)s (PAAs) and the third one by solvent evaporation of the soluble preimidized PI. From the stress measurement, the thermal expansion coefficient and Young's moduli have also been obtained. The thermal expansion coefficient and the Young's modulus are in the order of 9. 0 multiplied by 10** minus **6 degree C** minus **1 and 10 GPa, respectively. These values deviate from those published for bulk material which is explained by the in-plane orientation of the molecular chains in spun-on PI films.
引用
收藏
页码:815 / 828
页数:14
相关论文
共 50 条
  • [41] ESTER-TYPE PHOTOSENSITIVE POLYIMIDE PRECURSOR WITH LOW THERMAL-EXPANSION COEFFICIENT
    MATSUOKA, Y
    YOKOTA, K
    OGITANI, S
    IKEDA, A
    TAKAHASHI, H
    AI, H
    POLYMER ENGINEERING AND SCIENCE, 1992, 32 (21): : 1618 - 1622
  • [42] MEASUREMENT METHOD OF RESIDUAL-STRESS OF ROLLS AND COUNTERMEASURE TO THERMAL-STRESS BREAKING
    KIKUMA, T
    TETSU TO HAGANE-JOURNAL OF THE IRON AND STEEL INSTITUTE OF JAPAN, 1986, 72 (04): : S308 - S308
  • [43] Thickness-direction thermal expansion of polyimide films
    Tong, H.M.
    Saenger, K.L.
    Su, G.W.
    Polymer Engineering and Science, 1993, 33 (22): : 1502 - 1506
  • [44] MINIMIZATION OF RESIDUAL-STRESS IN SOI FILMS BY USING AIN INTERLAID INSULATOR
    OGURA, A
    EGAMI, K
    KIMURA, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1985, 24 (08): : L669 - L671
  • [45] SENSITIVITY OF RESIDUAL-STRESS TO MOISTURE PENETRATION ON OPTICAL THIN-FILMS
    KING, HJ
    LEE, BM
    SHAO, CA
    CHOU, C
    CHIANG, FP
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (1A): : 155 - 161
  • [46] A STUDY OF RESIDUAL-STRESS DISTRIBUTION THROUGH THE THICKNESS OF P(+) SILICON FILMS
    CHU, WH
    MEHREGANY, M
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1993, 40 (07) : 1245 - 1250
  • [47] AN ELECTRICAL METHOD FOR THE MEASUREMENT OF THERMAL-EXPANSION OF THIN-FILMS
    TIWARY, HV
    SAO, GD
    JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1981, 14 (12): : 1378 - 1380
  • [48] EFFECT OF THERMAL LOAD AND MECHANICAL LOAD ON THE RESIDUAL-STRESS OF A MACHINED WORKPIECE
    LIN, ZC
    LIN, YY
    LIU, CR
    INTERNATIONAL JOURNAL OF MECHANICAL SCIENCES, 1991, 33 (04) : 263 - 278
  • [49] RESIDUAL-STRESS MEASUREMENT IN SILICON SUBSTRATES AFTER THERMAL-OXIDATION
    MIURA, H
    OHTA, H
    SAKATA, H
    OKAMOTO, N
    JSME INTERNATIONAL JOURNAL SERIES A-MECHANICS AND MATERIAL ENGINEERING, 1993, 36 (03): : 302 - 308
  • [50] RESIDUAL-STRESS EVOLUTION IN TUNGSTEN THIN-FILMS UNDER IRRADIATION
    DURAND, N
    BADAWI, KF
    GOUDEAU, P
    NAUDON, A
    JOURNAL DE PHYSIQUE III, 1994, 4 (01): : 25 - 34