NEW APPROACH TO ELECTRON-BEAM LITHOGRAPHY

被引：17
|
作者：
FULTON, TA
DOLAN, GJ
机构：
来源：
APPLIED PHYSICS LETTERS | 1983年 / 42卷 / 08期
关键词：
D O I：
10.1063/1.94050
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：752 / 754
页数：3
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