GUIDED ION-BEAM STUDIES OF THE REACTIONS OF CO+ AND NI+ WITH CH3CL, CH3BR, CH3I - IMPLICATIONS FOR THE METAL-METHYL ION BOND-ENERGIES

被引：42

作者：

FISHER, ER ^{[1
]}

SUNDERLIN, LS ^{[1
]}

ARMENTROUT, PB ^{[1
]}

机构：

[1] UNIV UTAH,DEPT CHEM,SALT LAKE CITY,UT 84112

来源：

JOURNAL OF PHYSICAL CHEMISTRY | 1989年 / 93卷 / 21期

关键词：

D O I：

10.1021/j100358a026

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：7375 / 7382

页数：8

共 46 条

[21] INELASTIC AND REACTIVE SCATTERING OF XE(P-3(2)) BY CH3I, CH3BR AND CH3CL - OPACITY FUNCTIONS AND EXCITATION-FUNCTIONS
SIMONS, JP
WASHINGTON, C
CHEMICAL PHYSICS LETTERS, 1987, 138 (2-3) : 220 - 224
[22] FORCE-FIELD CALCULATIONS FROM INFRARED INTENSITIES AND ZETA CONSTANTS (FOR E SPECIES OF CH3CL, CH3BR, CH3I MOLECULES)
DAYANAND, V
RAVINDRANATH, K
CURRENT SCIENCE, 1989, 58 (02): : 52 - 54
[23] ION-PAIR PRODUCTION FROM CH3CL AND CH3BR WITH 118-NM LASER-LIGHT
MUNAKATA, T
KASUYA, T
CHEMICAL PHYSICS LETTERS, 1989, 154 (06) : 604 - 609
[24] BOND-DISSOCIATION ENERGIES AND RADICAL HEATS OF FORMATION IN CH3CL, CH2CL2, CH3BR, CH2BR2, CH2FCL, AND CHFCL2
TSCHUIKOWROUX, E
PADDISON, S
INTERNATIONAL JOURNAL OF CHEMICAL KINETICS, 1987, 19 (01) : 15 - 24
[25] Ion fragment imaging of the ion-pair photodissociation of CH3Cl, CH3Br, C2H5Cl, and C2H5Br at 118 nm
Suto, K
Sato, Y
Reed, CL
Skorokhodov, V
Matsumi, Y
Kawasaki, M
JOURNAL OF PHYSICAL CHEMISTRY A, 1997, 101 (07): : 1222 - 1226
[26] LASER-INDUCED FLUORESCENCE STUDY OF THE REACTIONS OF AR(3P2,0) WITH CH3H, CH3CL, CH3BR, CH3I, C2H6, SIH4, AND SI2H6
SEKIYA, H
NISHIMURA, Y
CHEMICAL PHYSICS LETTERS, 1990, 171 (04) : 291 - 296
[27] MEASUREMENTS OF EQUILIBRIA AND REACTIVITY OF CLUSTER IONS AT ATMOSPHERIC-PRESSURE - REACTIONS OF CL-(CHCL3)0-2 WITH CH3BR AND CH3I
GILES, K
GRIMSRUD, EP
JOURNAL OF PHYSICAL CHEMISTRY, 1993, 97 (07): : 1318 - 1323
[28] Constrained Dipole Oscillator Strength Distributions for CF4, CClF3, CCl2F2, CCl3F, CHF3, CH3F, CH3Cl, CH3Br, CH3I, C2F6, and CCl3CF3
Kumar, Ashok
Thakkar, Ajit J.
ZEITSCHRIFT FUR PHYSIKALISCHE CHEMIE-INTERNATIONAL JOURNAL OF RESEARCH IN PHYSICAL CHEMISTRY & CHEMICAL PHYSICS, 2016, 230 (10): : 1473 - 1486
[29] Low temperature chemically assisted ion-beam etching processes using Cl-2, CH3I, and IBr3 to etch InP optoelectronic devices
Eisele, KM
Daleiden, J
Ralston, J
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (03): : 1780 - 1783
[30] GUIDED ION-BEAM STUDIES OF THE REACTIONS OF MN+, CU+, AND ZN+ WITH SILANE - M(+)-SIHX (X=0-3) BOND-ENERGIES
KICKEL, BL
ARMENTROUT, PB
JOURNAL OF PHYSICAL CHEMISTRY, 1995, 99 (07): : 2024 - 2032

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