RAMAN INVESTIGATIONS ON DIAMOND FILMS AND CRYSTALS DEPOSITED BY PLASMA-ASSISTED CVD

被引：58
|
作者：
BOU, P
VANDENBULCKE, L
机构：
[1] Centre de Recherches sur la Chime de la Combustion et des Hautes Temperatures
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1991年 / 138卷 / 10期
关键词：
D O I：
10.1149/1.2085354
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Microwave plasma-assisted chemical vapor deposition has been utilized to deposit thin diamond films on molybdenum substrates. Micro-Raman spectroscopy has been carried out to examine the influence of the crystal size, laser power, and incident wavelength. A computer decomposition of Raman spectra has been attempted that permits appreciation of the evolution of deposit quality with experimental changes, through variations in spectrum contributions. We finally discuss the importance of the resonance Raman effect for sp2-type defect characterization, and the disorganization level provided by unequal light coupling with different cluster size.
引用
收藏
页码：2991 / 3000
页数：10
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