CONDITIONS FOR DEPOSITION OF DIELECTRIC SIO2 AND SI3N4 FILMS IN A VERTICAL REACTOR

被引：0
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作者：
KUZNETSOV, YN
PROKOPEV, EP
KOROBOV, IV
KOLTSOVA, NG
PAVLOV, SP
机构：
来源：
JOURNAL OF APPLIED CHEMISTRY OF THE USSR | 1976年 / 49卷 / 03期
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中图分类号：
O69 [应用化学];
学科分类号：
081704 ;
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页码：695 / 697
页数：3
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