ION-BEAM DEPOSITION OF METAL FILMS

被引:0
|
作者
NAMBA, S
KIM, PH
KANEKAMA, N
机构
关键词
D O I
10.1016/0042-207X(67)93180-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:166 / &
相关论文
共 50 条
  • [31] ION-BEAM ASSISTED DEPOSITION OF EVAPORATED THIN SILVER FILMS
    BURAT, O
    STAMBOULI, V
    BOUCHIER, D
    GAUTHERIN, G
    VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 1989, 44 (245): : 65 - 67
  • [32] VACUUM DEPOSITION OF FILMS BY SPUTTERING USING AN ION-BEAM SOURCE
    CHOPRA, KL
    RANDLETT, MR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1966, 3 (05): : 304 - &
  • [33] DEPOSITION OF TANTALUM THIN-FILMS BY ION-BEAM SPUTTERING
    YAMANAKA, S
    NAOE, M
    KAWAI, S
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1977, 16 (07) : 1245 - 1246
  • [34] VACUUM DEPOSITION OF FILMS BY SPUTTERING USING AN ION-BEAM SOURCE
    CHOPRA, KL
    RANDLETT, MR
    VACUUM, 1967, 17 (03) : 165 - &
  • [35] ION-BEAM DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON FILMS
    KASDAN, A
    GOSHORN, DP
    LANFORD, WA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 305 - 306
  • [36] ION-BEAM SPUTTER DEPOSITION AND EPITAXY OF CDTE AND HGCDTE FILMS
    KRISHNASWAMY, SV
    RIEGER, JH
    DOYLE, NJ
    FRANCOMBE, MH
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04): : 2106 - 2110
  • [37] Ion-beam assisted pulsed laser deposition of textured transition-metal nitride films
    Huehne, Ruben
    Kidszun, Martin
    Gueth, Konrad
    Thoss, Franziska
    Rellinghaus, Bernd
    Schultz, Ludwig
    Holzapfel, Bernhard
    ARTIFICIALLY INDUCED GRAIN ALIGNMENT IN THIN FILMS, 2009, 1150 : 59 - 64
  • [38] Focused ion-beam direct deposition of metal thin film
    Nagamachi, S
    Yamakage, Y
    Ueda, M
    Maruno, H
    Ishikawa, J
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1996, 67 (06): : 2351 - 2359
  • [39] FORMATION OF ALUMINUM FILMS ON SILICON BY ION-BEAM DEPOSITION - A COMPARISON WITH IONIZED CLUSTER BEAM DEPOSITION
    ZUHR, RA
    HAYNES, TE
    GALLOWAY, MD
    TANAKA, S
    YAMADA, A
    YAMADA, I
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1991, 59 : 308 - 311
  • [40] Comparison of surface morphologies of SiO2 films prepared by ion-beam induced chemical vapor deposition and ion-beam assisted deposition
    Matsutani, T
    Asanuma, T
    Liu, C
    Kiuchi, M
    Takeuchi, T
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2003, 206 : 343 - 347