Heterodyne AC Kelvin Probe Force Microscopy for Nanoscale Surface Potential Imaging in Liquids

被引:0
|
作者
Hackl, Thomas [1 ]
Poik, Mathias [1 ]
Schitter, Georg [1 ]
机构
[1] Tech Univ Wien, Automat & Control Inst ACIN, A-1040 Vienna, Austria
基金
奥地利科学基金会;
关键词
Electric potential; Force; Surface topography; Electrostatics; Electrostatic measurements; Spatial resolution; Semiconductor device measurement; Aqueous environment; heterodyne detection; Kelvin probe force microscopy (KPFM); surface potential;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Knowledge of electric charge and potential distributions at the nanoscale is of great interest in the fields of material science and biology. The required high measurement accuracy, spatial resolution, and applicability to aqueous environments are not always provided by conventional techniques such as Kelvin probe force microscopy (KPFM) due to averaging artifacts and the use of a dc bias. This article presents the development of an atomic force microscopy measurement mode, enabling quantitative surface potential measurements of nanoscale structures with high measurement accuracy in air and liquid (aqueous) environments. Averaging artifacts caused by the influence of the cantilever cone, cantilever beam and tip-sample distance in dc-bias-free KPFM (AC-KPFM) are eliminated by the implemented heterodyne detection and single-pass operation. The accuracy of the potential measurement as compared to amplitude-modulated KPFM (AM-KPFM) modes is greatly improved while keeping the advantages of closed-loop and dc-bias-free operation. Experiments on a gold-aluminum test sample and collagen fibrils show quantitative surface potential measurements on nanoscale structures and operability in an aqueous environment.
引用
收藏
页数:8
相关论文
共 50 条
  • [31] Surface potential difference of biomineralized inorganic nanodot by Kelvin probe force microscopy
    Yamamoto, Shin-ichi
    Yoshioka, Hideki
    Uraoka, Yukiharu
    Fuyuki, Takashi
    Okuda, Mitsuhiro
    Yamashita, Ichiro
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (8B): : 5647 - 5651
  • [32] Surface potential measurement of oligothiophene ultrathin films by Kelvin probe force microscopy
    Umeda, Keiichi
    Kobayashi, Kei
    Ishida, Kenji
    Hotta, Shu
    Yamada, Hirofumi
    Matsushige, Kazumi
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2001, 40 (6 B): : 4381 - 4383
  • [33] Dual Harmonic Kelvin Probe Force Microscopy for Surface Potential Measurements of Ferroelectrics
    Collins, L.
    Kilpatrick, J. I.
    Bhaskaran, M.
    Sriram, S.
    Weber, S. A. L.
    Jarvis, S. P.
    Rodriguez, B. J.
    2012 INTERNATIONAL SYMPOSIUM ON APPLICATIONS OF FERROELECTRICS HELD JOINTLY WITH 11TH IEEE ECAPD AND IEEE PFM (ISAF/ECAPD/PFM), 2012,
  • [34] Surface potential relaxation of ferroelectric domain investigated by Kelvin probe force microscopy
    Kim, Jiyoon
    Kim, Yunseok
    No, Kwangsoo
    Buhlmann, Simon
    Hong, Seungbum
    Nam, Yun-Woo
    Kim, Seung-Hyun
    INTEGRATED FERROELECTRICS, 2006, 85 : 25 - 30
  • [35] Know your full potential: Quantitative Kelvin probe force microscopy on nanoscale electrical devices
    Axt, Amelie
    Hermes, Ilka M.
    Bergmann, Victor W.
    Tausendpfund, Niklas
    Weber, Stefan A. L.
    BEILSTEIN JOURNAL OF NANOTECHNOLOGY, 2018, 9 : 1809 - 1819
  • [36] The influence of surface topography on Kelvin probe force microscopy
    Sadewasser, S.
    Leendertz, C.
    Streicher, F.
    Lux-Steiner, M. Ch
    NANOTECHNOLOGY, 2009, 20 (50)
  • [37] Charge erasure analysis on the nanoscale using Kelvin probe force microscopy
    Lin, Shi-quan
    Shao, Tian-min
    AIP ADVANCES, 2017, 7 (07):
  • [38] Nanoscale electronic measurements of semiconductors using Kelvin probe force microscopy
    Rosenwaks, Y
    Shikler, R
    Scanning Probe Microscopy: Characterization, Nanofabrication and Device Application of Functional Materials, 2005, 186 : 119 - +
  • [39] Kelvin probe force microscopy of semiconductor surface defects
    Rosenwaks, Y
    Shikler, R
    Glatzel, T
    Sadewasser, S
    PHYSICAL REVIEW B, 2004, 70 (08) : 085320 - 1
  • [40] Nanoscale characterization of copper oxide films by Kelvin Probe Force Microscopy
    Berthold, Tobias
    Benstetter, Guenther
    Frammelsberger, Werner
    Rodriguez, Rosana
    Nafria, Montserrat
    THIN SOLID FILMS, 2015, 584 : 310 - 315