FABRICATING MAGNETIC CO-NI-C THIN-FILM ALLOYS BY ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION

被引:12
|
作者
KIM, YG [1 ]
BYUN, D [1 ]
HUTCHINGS, C [1 ]
DOWBEN, PA [1 ]
HEJASE, H [1 ]
SCHRODER, K [1 ]
机构
[1] SYRACUSE UNIV,DEPT CHEM ENGN & MAT SCI,SYRACUSE,NY 13244
关键词
D O I
10.1063/1.350046
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have deposited CoxNiy-C films with a variety of compositions to verify dependence of the saturation magnetization on the composition. These experiments suggest that we can produce CoxNiy-C films with a variety of magnetic properties. The CoxNiy-C films were fabricated by ultraviolet decomposition of cobaltocene and nickelocene. We demonstrated that the photolytic decomposition of these metallocenes produces cyclopentadienyl (C5H5) species, consistent with recent studies of the energetics of the ligand metal bonds.
引用
收藏
页码:6062 / 6064
页数:3
相关论文
共 50 条
  • [41] Organic thin-film transistors based on vapor-deposition polymerized gate insulators
    Pyo, SW
    Lee, DH
    Koo, JR
    Kim, JH
    Shim, JH
    Kim, YK
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (1B): : 652 - 655
  • [42] THIN-FILM FORMATION OF POLYMORPH-CONTROLLED TRIGLYCERIDES BY PHYSICAL VAPOR-DEPOSITION
    YASE, K
    OGIHARA, S
    SANO, M
    OKADA, M
    JOURNAL OF CRYSTAL GROWTH, 1992, 116 (3-4) : 333 - 339
  • [43] CO2-LASER CHEMICAL VAPOR-DEPOSITION OF AMORPHOUS-SILICON - GAS-PHASE PROCESSES AND THIN-FILM PROPERTIES
    GOLUSDA, E
    LUHMANN, KD
    MOLLEKOPF, G
    STAFAST, H
    WACKER, M
    BERICHTE DER BUNSEN-GESELLSCHAFT-PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 1991, 95 (11): : 1414 - 1416
  • [44] Pressure Control Organic Vapor Deposition Methods for Fabricating Organic Thin-Film Transistors
    Ahn, SeongDeok
    Kang, Seong Youl
    Oh, Ji Young
    Suh, Kyung Soo
    Cho, Kyoung Ik
    Koo, Jae Bon
    ETRI JOURNAL, 2012, 34 (06) : 970 - 973
  • [45] NUCLEATION AND FILM GROWTH IN PHOTOCHEMICAL VAPOR-DEPOSITION OF ALUMINUM THIN-FILM USING DIMETHYLALUMINUM HYDRIDE
    KAWAI, T
    HANABUSA, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (10): : 4690 - 4693
  • [46] COHERENT GROWTH OF ZNSE THIN-FILM AT LOW GROWTH TEMPERATURE BY HYDROGEN RADICAL ENHANCED CHEMICAL VAPOR-DEPOSITION
    GOTOH, J
    KOBAYASHI, T
    SHIRAI, H
    HANNA, J
    SHIMIZU, I
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1990, 29 (10): : L1767 - L1770
  • [47] NOVEL VOLATILE BARIUM BETA-DIKETONE CHELATES FOR CHEMICAL VAPOR-DEPOSITION OF BARIUM FLUORIDE THIN-FILM
    SATO, H
    SUGAWARA, S
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1992, 204 : 188 - INOR
  • [48] GAS-PHASE NUCLEATION IN GAAS THIN-FILM PREPARATION BY METAL ORGANIC-CHEMICAL VAPOR-DEPOSITION
    OKUYAMA, K
    HUANG, DD
    SEINFELD, JH
    TANI, N
    MATSUI, I
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (01): : 1 - 11
  • [49] FREESTANDING THIN-FILM GE SINGLE-CRYSTALS GROWN BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION
    OUTLAW, RA
    HOPSON, P
    JOURNAL OF APPLIED PHYSICS, 1984, 55 (06) : 1461 - 1463
  • [50] THIN-FILM GAAS SOLAR-CELLS ON GERMANIUM-COATED SILICON SUBSTRATES BY CHEMICAL VAPOR-DEPOSITION
    CHU, SS
    CHU, TL
    FIROUZI, H
    SOLAR CELLS, 1987, 20 (03): : 237 - 243