HIGH-TEMPERATURE PLASMA-ETCHING OF SILICON AND SILICON DIOXIDE

被引：0

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作者：

CHIU, KCR

SNOW, WR

机构：

[1] SYNERTEK INC,SANTA CLARA,CA 95051

[2] PACIFIC WESTERN SYST INC,MT VIEW,CA 94041

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 03期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：C81 / C81

页数：1

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