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- [1] PLASMA-ETCHING OF SILICON AND SILICON DIOXIDE WITH HYDROGEN-FLUORIDE MIXTURESJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (03) : C88 - C88SMOLINSKY, GMAYER, TMTRUESDALE, EA
- [2] PLASMA-ETCHING OF SILICON AND SILICON DIOXIDE WITH HYDROGEN-FLUORIDE MIXTURESJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (08) : 1770 - 1772SMOLINSKY, GMAYER, TMTRUESDALE, EA
- [4] RAPID PLASMA-ETCHING OF SILICON, SILICON DIOXIDE AND SILICON-NITRIDE USING MICROWAVE DISCHARGESSEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1993, 8 (04) : 599 - 604RAY, SKMAITI, CKCHAKRABORTI, NB
- [5] EFFECT OF OXYGEN ON FLUORINE-BASED REMOTE PLASMA-ETCHING OF SILICON AND SILICON DIOXIDEJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03): : 1984 - 1988LOEWENSTEIN, LM
- [6] HIGH-SELECTIVITY PLASMA-ETCHING OF SILICON DIOXIDE ON SINGLE-WAFER ETCHERSJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 691 - 695YIN, GZBENDOR, MCHANG, MSYEP, TO
- [7] PLASMA-ETCHING OF SILICON WITH NITROGEN TRIFLUORIDEJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (03) : C89 - C89EISELE, KM
- [8] SILICON ROUGHNESS INDUCED BY PLASMA-ETCHINGJOURNAL OF APPLIED PHYSICS, 1994, 75 (11) : 7498 - 7506PETRI, RBRAULT, PVATEL, OHENRY, DANDRE, EDUMAS, PSALVAN, F
- [9] INSITU OBSERVATION IN SILICON PLASMA-ETCHINGJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (03) : C91 - C91NISHIZAWA, JHAYASAKA, N
- [10] PLASMA-ETCHING OF POLYSILICON AND SILICON DIOXIDE IN A PARALLEL-PLATE REACTORACTA PHYSICA SLOVACA, 1985, 35 (03) : 156 - 161MIKUS, O