ON THE DIFFUSION PROFILE OF BORON IN SILICON AT HIGH-CONCENTRATIONS

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作者：
GAISEANU, F
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PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1983年 / 77卷 / 01期
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T [工业技术];
学科分类号：
08 ;
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页码：K59 / K61
页数：3
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