ABSORPTION AND EXPOSURE IN POSITIVE PHOTORESIST

被引：46
|
作者：
MACK, CA
机构：
来源：
APPLIED OPTICS | 1988年 / 27卷 / 23期
关键词：
D O I：
10.1364/AO.27.004913
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：4913 / 4919
页数：7
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