COMPARISON OF ELECTRON-BEAM AND OPTICAL PROJECTION LITHOGRAPHY IN THE REGION OF ONE MICROMETER

被引：0
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作者：
CHANG, TS
KYSER, DF
TING, CH
机构：
来源：
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | 1981年 / 275卷
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中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
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页码：117 / 121
页数：5
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